Si 기판위에 Hot filmanent CVD법으로 제조된 다이아몬드 박막의 응력 해석 = Stress analysis in diamond thin films on Si wafer deposited by hot filament chemical vapor deposition

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dc.contributor.advisor홍순형-
dc.contributor.advisorHong, Soon-Hyung-
dc.contributor.author차승일-
dc.contributor.authorCha, Seung-Il-
dc.date.accessioned2011-12-15T01:31:29Z-
dc.date.available2011-12-15T01:31:29Z-
dc.date.issued1998-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=133561&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/50690-
dc.description학위논문(석사) - 한국과학기술원 : 재료공학과, 1998.2, [ 85 p. ]-
dc.languagekor-
dc.publisher한국과학기술원-
dc.subject열처리-
dc.subject잔류응력-
dc.subject다이아몬드박막-
dc.subject화학기상증착-
dc.subjectAnnealing-
dc.subjectCVD-
dc.subjectStress-
dc.subjectDiamond thin film-
dc.titleSi 기판위에 Hot filmanent CVD법으로 제조된 다이아몬드 박막의 응력 해석 = Stress analysis in diamond thin films on Si wafer deposited by hot filament chemical vapor deposition-
dc.typeThesis(Master)-
dc.identifier.CNRN133561/325007-
dc.description.department한국과학기술원 : 재료공학과, -
dc.identifier.uid000963612-
dc.contributor.localauthor홍순형-
dc.contributor.localauthorHong, Soon-Hyung-
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MS-Theses_Master(석사논문)
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