Inductively coupled plasma enhanced chemical vapor deposition (ICP-CVD) 법으로 증착한 비정질 질화규소 박막의 특성Characterization of amorphous silicon nitride thin film deposited by inductively coupled plasma enhanced chemical vapor deposition (ICP-CVD)
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | 배병수 | - |
| dc.contributor.advisor | Bae, Byeong-Soo | - |
| dc.contributor.author | 한상수 | - |
| dc.contributor.author | Han, Sang-Soo | - |
| dc.date.accessioned | 2011-12-15T01:30:48Z | - |
| dc.date.available | 2011-12-15T01:30:48Z | - |
| dc.date.issued | 1997 | - |
| dc.identifier.uri | http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=113163&flag=dissertation | - |
| dc.identifier.uri | http://hdl.handle.net/10203/50649 | - |
| dc.description | 학위논문(석사) - 한국과학기술원 : 재료공학과, 1997.2, [ v, 98 p. ] | - |
| dc.language | kor | - |
| dc.publisher | 한국과학기술원 | - |
| dc.subject | 광학적 대간격 | - |
| dc.subject | 수소량 | - |
| dc.subject | 굴절율 | - |
| dc.subject | 유도플라즈마화학증착법 | - |
| dc.subject | Urbach 에너지 | - |
| dc.subject | Urbach energy | - |
| dc.subject | Optical band gap | - |
| dc.subject | Hydrogen content | - |
| dc.subject | Refractive index | - |
| dc.subject | ICP-CVD | - |
| dc.title | Inductively coupled plasma enhanced chemical vapor deposition (ICP-CVD) 법으로 증착한 비정질 질화규소 박막의 특성 | - |
| dc.title.alternative | Characterization of amorphous silicon nitride thin film deposited by inductively coupled plasma enhanced chemical vapor deposition (ICP-CVD) | - |
| dc.type | Thesis(Master) | - |
| dc.identifier.CNRN | 113163/325007 | - |
| dc.description.department | 한국과학기술원 : 재료공학과, | - |
| dc.identifier.uid | 000953642 | - |
| dc.contributor.localauthor | 배병수 | - |
| dc.contributor.localauthor | Bae, Byeong-Soo | - |
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