플라즈마 화학증착법으로 제조한 수소화된 비정질 실리콘 (a-Si:H) 박막의 결정화 거동에 관한 연구A study on the behavior of crystallization of hydrogenated amorphous silicon (a-Si:H) films prepared by plasma enhanced chemical vapor deposition

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Advisors
이재영Lee, Jai-Young
Description
한국과학기술원 : 재료공학과,
Publisher
한국과학기술원
Issue Date
1994
Identifier
69515/325007 / 000923538
Language
kor
Description

학위논문(석사) - 한국과학기술원 : 재료공학과, 1994.2, [ 72 p. ]

URI
http://hdl.handle.net/10203/50536
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=69515&flag=dissertation
Appears in Collection
MS-Theses_Master(석사논문)
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