플라즈마 화학증착법에 의하여 증착된 Aluminum oxide 박막의 에칭 특성에 관한 연구A study on etching properties of aluminum oxide films deposited by plasma enhanced chemical vapor deposition

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dc.contributor.advisor천성순-
dc.contributor.advisorChun, Soung-Soon-
dc.contributor.author정진기-
dc.contributor.authorJung, Jin-Ki-
dc.date.accessioned2011-12-15T01:28:08Z-
dc.date.available2011-12-15T01:28:08Z-
dc.date.issued1991-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=68061&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/50485-
dc.description학위논문(석사) - 한국과학기술원 : 재료공학과, 1991.2, [ [iv], 85 p. ]-
dc.languagekor-
dc.publisher한국과학기술원-
dc.title플라즈마 화학증착법에 의하여 증착된 Aluminum oxide 박막의 에칭 특성에 관한 연구-
dc.title.alternativeA study on etching properties of aluminum oxide films deposited by plasma enhanced chemical vapor deposition-
dc.typeThesis(Master)-
dc.identifier.CNRN68061/325007-
dc.description.department한국과학기술원 : 재료공학과, -
dc.identifier.uid000891464-
dc.contributor.localauthor천성순-
dc.contributor.localauthorChun, Soung-Soon-
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MS-Theses_Master(석사논문)
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