ALD와 PEALD를 이용한 $Al_2O_3$ 박막 증착에 관한 연구 = A study on the $Al_2O_3$ thin film deposition by ALD and PEALD

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Advisors
강상원researcherKang, Sang-Wonresearcher
Description
한국과학기술원 : 재료공학과,
Publisher
한국과학기술원
Issue Date
2003
Identifier
231093/325007  / 000985336
Language
kor
Description

학위논문(박사) - 한국과학기술원 : 재료공학과, 2003.8, [ viii, 112 p. ]

Keywords

박막; 계면 산화막; 알루미나; 원자층 단위 증착법; 절연막; interface stability; alumina; atomic layer deposition; PEALD; ALD

URI
http://hdl.handle.net/10203/50443
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=231093&flag=dissertation
Appears in Collection
MS-Theses_Ph.D.(박사논문)
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