구리확산방지막용 질화텅스텐 박막의 열적 안정성과 미세구조Thermal stabilities and microstructures of $WN_x$ films as a Cu diffusion barrier
- Advisors
- 박종욱researcher; Park, Chong-Ookresearcher
- Description
- 한국과학기술원 : 재료공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 2000
- Identifier
- 157707/325007 / 000965195
- Language
- kor
- Description
학위논문(박사) - 한국과학기술원 : 재료공학과, 2000.2, [ iv, 101 p. ]
- Keywords
금속배선; 질화텅스텐; 확산방지막; 구리; Cu; Metallization; WN; Tungsten nitride; Diffusion barrier
- Appears in Collection
- MS-Theses_Ph.D.(박사논문)
- Files in This Item
- There are no files associated with this item.
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