구리확산방지막용 질화텅스텐 박막의 열적 안정성과 미세구조 = Thermal stabilities and microstructures of $WN_x$ films as a Cu diffusion barrier

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Advisors
박종욱researcherPark, Chong-Ookresearcher
Description
한국과학기술원 : 재료공학과,
Publisher
한국과학기술원
Issue Date
2000
Identifier
157707/325007 / 000965195
Language
kor
Description

학위논문(박사) - 한국과학기술원 : 재료공학과, 2000.2, [ iv, 101 p. ]

Keywords

금속배선; 질화텅스텐; 확산방지막; 구리; Cu; Metallization; WN; Tungsten nitride; Diffusion barrier

URI
http://hdl.handle.net/10203/50385
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=157707&flag=dissertation
Appears in Collection
MS-Theses_Ph.D.(박사논문)
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