플라즈마 화학 증착법으로 제조된 실리콘 산화물 박막의 대기중 응력 변화 거동에 관한 연구 = A study on the stress behavior in plasma-enhanced chemical vapor deposited silicon dioxide films exposed to air

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Advisors
이재영Lee, Jai-Young
Description
한국과학기술원 : 재료공학과,
Publisher
한국과학기술원
Issue Date
2000
Identifier
157696/325007 / 000955138
Language
kor
Description

학위논문(박사) - 한국과학기술원 : 재료공학과, 2000.2, [ v, 127 p. ]

Keywords

응력; 실리콘 산화막; 수소; Hydrogen; Stress; Silicon oxide

URI
http://hdl.handle.net/10203/50374
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=157696&flag=dissertation
Appears in Collection
MS-Theses_Ph.D.(박사논문)
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