Reactive multi-target sputtering 법으로 증착된 P(L)ZT 박막의 제조 특성및 기억소자로의 응용에 관한 연구Deposition characteristics of P(L)ZT ferroelectric film fabricated by reactive multi-target sputtering method and its applications for memory devices
- Advisors
- 이원종researcher; Lee, Won-Jongresearcher
- Description
- 한국과학기술원 : 재료공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 1999
- Identifier
- 155979/325007 / 000945126
- Language
- kor
- Description
학위논문(박사) - 한국과학기술원 : 재료공학과, 1999.8, [ vi, 162 p. ]
- Keywords
이력곡선; 스퍼터링; 페로브스카이트 상; 강유전체; 씨앗층; Fatigue; Seed layer; Multi-target sputter; Perovskite phase; PLZT
- Appears in Collection
- MS-Theses_Ph.D.(박사논문)
- Files in This Item
- There are no files associated with this item.
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