텅스텐 박막의 저압화학 증착 기구 및 증착층의 특성에 관한 연구A study on the mechanisms of tungsten low pressure chemical vapor deposition and the characteristics of the deposited layer
- Description
- 한국과학기술원 : 재료공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 1989
- Identifier
- 61389/325007 / 000845136
- Language
- kor
- Description
학위논문(박사) - 한국과학기술원 : 재료공학과, 1989.2, [ [v], 134 p. ]
- Keywords
Low pressure chemical vapor deposition.
- Appears in Collection
- MS-Theses_Ph.D.(박사논문)
- Files in This Item
- There are no files associated with this item.
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