학위논문(박사) - 한국과학기술원 : 재료공학과, 2002.8, [ xi, 139 p. ]
Ta-N; Diffusion barrier; ALD (Atomic Layer Deposition); PEALD (Plasma Enhanced Atomic Layer Deposition); Ti-Si-N; Ti-Si-N; Ta-N; 확산 방지막; 원자층 증착법; 플라즈마 원자층 증착법
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