산화-환원 ALD 증착법에 의해 형성된 Nickel 박막의 특성에 관한 연구 = A study on the nickel thin films formed by oxidation-reduction ALD

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dc.contributor.advisor강상원-
dc.contributor.advisorKang, Sang-Won-
dc.contributor.author채정헌-
dc.contributor.authorChae, Jung-Hun-
dc.date.accessioned2011-12-15T01:04:21Z-
dc.date.available2011-12-15T01:04:21Z-
dc.date.issued2002-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=177275&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/50261-
dc.description학위논문(박사) - 한국과학기술원 : 재료공학과, 2002.2, [ xi, 95 p. ]-
dc.languagekor-
dc.publisher한국과학기술원-
dc.subject니켈-
dc.subject원자층 단위 증착법-
dc.subjectAtomic Layer Deposition-
dc.subjectglue layer-
dc.subjectNickel-
dc.title산화-환원 ALD 증착법에 의해 형성된 Nickel 박막의 특성에 관한 연구 = A study on the nickel thin films formed by oxidation-reduction ALD-
dc.typeThesis(Ph.D)-
dc.identifier.CNRN177275/325007-
dc.description.department한국과학기술원 : 재료공학과, -
dc.identifier.uid000975385-
dc.contributor.localauthor채정헌-
dc.contributor.localauthorChae, Jung-Hun-
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MS-Theses_Ph.D.(박사논문)
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