(A) study on the contact damage in silicon nitride bilayer = 질화규소 이층 층상재료의 접촉하중에 의한 손상거동 연구

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Advisors
Kim, Do-Kyungresearcher김도경researcher
Description
한국과학기술원 : 재료공학과,
Publisher
한국과학기술원
Issue Date
1998
Identifier
143465/325007 / 000955254
Language
eng
Description

학위논문(박사) - 한국과학기술원 : 재료공학과, 1998.8, [ xix, 211 p. ]

Keywords

Damage tolerance; Hertzian indentation; Bilayer; Contact damage; Silicon nitride; 질화규소; 손상저항성; 구형압자 압흔법; 이층 층상재료; 접촉손상

URI
http://hdl.handle.net/10203/50224
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=143465&flag=dissertation
Appears in Collection
MS-Theses_Ph.D.(박사논문)
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