이온빔 산화와 열 산화에 의해 형성된 Si(001)-SiO$_2$계면의 구조The structure of the Si(001)-SiO$_2$ interface formed by ion beam oxidation and thermal oxidation

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dc.contributor.advisor최시경-
dc.contributor.advisorChoi, Si-Kyoung-
dc.contributor.author김영필-
dc.contributor.authorKim, Young-Pil-
dc.date.accessioned2011-12-15T01:03:11Z-
dc.date.available2011-12-15T01:03:11Z-
dc.date.issued1998-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=133521&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/50192-
dc.description학위논문(박사) - 한국과학기술원 : 재료공학과, 1998.2, [ iv, 109 p. ]-
dc.languagekor-
dc.publisher한국과학기술원-
dc.title이온빔 산화와 열 산화에 의해 형성된 Si(001)-SiO$_2$계면의 구조-
dc.title.alternativeThe structure of the Si(001)-SiO$_2$ interface formed by ion beam oxidation and thermal oxidation-
dc.typeThesis(Ph.D)-
dc.identifier.CNRN133521/325007-
dc.description.department한국과학기술원 : 재료공학과, -
dc.identifier.uid000925069-
dc.contributor.localauthor김영필-
dc.contributor.localauthorKim, Young-Pil-
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MS-Theses_Ph.D.(박사논문)
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