RFreactive sputtering법으로 제조한 탄성표면파 소자용 AlN:H 박막과 ZnO/AlN 이층박막의 특성에 관한 연구 = A study on the properties of AlN:H thin films and ZnO/AlN bilayered films prepared by RF reactive sputtering for the application of SAW devices

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Advisors
이재영Lee, Jai-Young
Description
한국과학기술원 : 재료공학과,
Publisher
한국과학기술원
Issue Date
1997
Identifier
128166/325007 / 000935219
Language
kor
Description

학위논문(박사) - 한국과학기술원 : 재료공학과, 1997.8, [ v, 133 p. ]

Keywords

탄성표면파; 산화아연/질화알루미늄; 수소화된 질화알루미늄; 스퍼터링; Sputtering; SAW; ZnO/AlN; AlN:H

URI
http://hdl.handle.net/10203/50186
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=128166&flag=dissertation
Appears in Collection
MS-Theses_Ph.D.(박사논문)
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