Reactive RF sputtering 법으로 제조한 ALN박막의 성장기구에 관한 연구A study on the growth mechanism of ALN thin films by reactive RF sputtering

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dc.contributor.advisor이재영-
dc.contributor.advisorLee, Jai-Young-
dc.contributor.author이환철-
dc.contributor.authorLee, Hwan-Chul-
dc.date.accessioned2011-12-15T01:01:48Z-
dc.date.available2011-12-15T01:01:48Z-
dc.date.issued1994-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=69690&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/50109-
dc.description학위논문(박사) - 한국과학기술원 : 재료공학과, 1994.8, [ v, 151 p. ]-
dc.languagekor-
dc.publisher한국과학기술원-
dc.subjectRF sputtering (Physics)-
dc.titleReactive RF sputtering 법으로 제조한 ALN박막의 성장기구에 관한 연구-
dc.title.alternativeA study on the growth mechanism of ALN thin films by reactive RF sputtering-
dc.typeThesis(Ph.D)-
dc.identifier.CNRN69690/325007-
dc.description.department한국과학기술원 : 재료공학과, -
dc.identifier.uid000885390-
dc.contributor.localauthor이환철-
dc.contributor.localauthorLee, Hwan-Chul-
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MS-Theses_Ph.D.(박사논문)
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