반응기체의 분압이 $Al_2O_3$ 의 화학증탁에 미치는 영향에 관한 연구Effect of partial pressure of reactantgas on the chemical vapor deposition of $Al_2O_3$
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | 천성순 | - |
| dc.contributor.advisor | Chun, Sung-Soon | - |
| dc.contributor.author | 김재곤 | - |
| dc.contributor.author | Kim, Jae-Gon | - |
| dc.date.accessioned | 2011-12-15 | - |
| dc.date.available | 2011-12-15 | - |
| dc.date.issued | 1982 | - |
| dc.identifier.uri | http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=60779&flag=dissertation | - |
| dc.identifier.uri | http://hdl.handle.net/10203/49977 | - |
| dc.description | 학위논문(박사) - 한국과학기술원 : 재료공학과, 1982.2, [ iv, 91 p. ] | - |
| dc.language | kor | - |
| dc.publisher | 한국과학기술원 | - |
| dc.subject | Deposition rate. | - |
| dc.subject | Chemical vapor deposition. | - |
| dc.title | 반응기체의 분압이 $Al_2O_3$ 의 화학증탁에 미치는 영향에 관한 연구 | - |
| dc.title.alternative | Effect of partial pressure of reactantgas on the chemical vapor deposition of $Al_2O_3$ | - |
| dc.type | Thesis(Ph.D) | - |
| dc.identifier.CNRN | 60779/325007 | - |
| dc.description.department | 한국과학기술원 : 재료공학과, | - |
| dc.identifier.uid | 000775027 | - |
| dc.contributor.localauthor | 김재곤 | - |
| dc.contributor.localauthor | Kim, Jae-Gon | - |
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- MS-Theses_Ph.D.(박사논문)
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