반응기체의 분압이 $Al_2O_3$ 의 화학증탁에 미치는 영향에 관한 연구 = Effect of partial pressure of reactantgas on the chemical vapor deposition of $Al_2O_3$

Cited 0 time in webofscience Cited 0 time in scopus
  • Hit : 324
  • Download : 0
Advisors
천성순researcherChun, Sung-Soonresearcher
Description
한국과학기술원 : 재료공학과,
Publisher
한국과학기술원
Issue Date
1982
Identifier
60779/325007 / 000775027
Language
kor
Description

학위논문(박사) - 한국과학기술원 : 재료공학과, 1982.2, [ iv, 91 p. ]

Keywords

Deposition rate.; Chemical vapor deposition.

URI
http://hdl.handle.net/10203/49977
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=60779&flag=dissertation
Appears in Collection
MS-Theses_Ph.D.(박사논문)
Files in This Item
There are no files associated with this item.

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0