플라즈마 화학증착법에 의해 제조된 기억소자용 고유전 탄탈륨 산화박막에 관한 연구 = PECVD $Ta_2O_5$ dielectric thin films for memory devices

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Advisors
천성순researcherChun, Soung-Soonresearcher
Description
한국과학기술원 : 전자재료공학과,
Publisher
한국과학기술원
Issue Date
1995
Identifier
99213/325007 / 000895089
Language
kor
Description

학위논문(박사) - 한국과학기술원 : 전자재료공학과, 1995.2, [ vi, 136 p. ]

URI
http://hdl.handle.net/10203/49917
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=99213&flag=dissertation
Appears in Collection
MS-Theses_Ph.D.(박사논문)
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