플라즈마 화학증착법에 의해 증착된 알루미늄 산화막의 증착 기구와 전기적 특성에 관한 연구 = A study on the deposition mechanism and the electrical properties of aluminum oxide films deposited by plasma enhanced chemical vapor deposition

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Advisors
천성순researcherChun, Soung-Soonresearcher
Description
한국과학기술원 : 전자재료공학과,
Publisher
한국과학기술원
Issue Date
1993
Identifier
68193/325007 / 000885080
Language
kor
Description

학위논문(박사) - 한국과학기술원 : 전자재료공학과, 1993.8, [ [iv], 180, [4] p. ]

URI
http://hdl.handle.net/10203/49910
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=68193&flag=dissertation
Appears in Collection
MS-Theses_Ph.D.(박사논문)
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