플라즈마 화학증착법에 의해 증착된 알루미늄 산화막의 증착 기구와 전기적 특성에 관한 연구A study on the deposition mechanism and the electrical properties of aluminum oxide films deposited by plasma enhanced chemical vapor deposition

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Advisors
천성순researcherChun, Soung-Soonresearcher
Description
한국과학기술원 : 전자재료공학과,
Publisher
한국과학기술원
Issue Date
1993
Identifier
68193/325007 / 000885080
Language
kor
Description

학위논문(박사) - 한국과학기술원 : 전자재료공학과, 1993.8, [ [iv], 180, [4] p. ]

URI
http://hdl.handle.net/10203/49910
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=68193&flag=dissertation
Appears in Collection
MS-Theses_Ph.D.(박사논문)
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