Synthesis of copolymers containing hydroxycyclohexyl methacrylate and their application as DUV resist = 히드록시시클로헥실 메타크릴레이트가 포함된 공중합체의 합성 및 원자외선 레지스트로서의 응용

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Advisors
Kim, Jin-Baekresearcher김진백researcher
Description
한국과학기술원 : 신소재공학과,
Publisher
한국과학기술원
Issue Date
1998
Identifier
143546/325007 / 000939063
Language
eng
Description

학위논문(박사) - 한국과학기술원 : 신소재공학과, 1998.8, [ xii, 94 p. ]

Keywords

Alicyclic methacrylate; Hydroxycyclohexyl methacrylate; DUV photoresist; Dry-etching resistance; 건식내에칭성; 지방족 고리형 메타크릴레이트; 히드록시시클로헥실 메타크릴레이트; 원자외선 레지스트

URI
http://hdl.handle.net/10203/49667
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=143546&flag=dissertation
Appears in Collection
MS-Theses_Ph.D.(박사논문)
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