DC Field | Value | Language |
---|---|---|
dc.contributor.advisor | Chang, Hong-Young | - |
dc.contributor.advisor | 장홍영 | - |
dc.contributor.author | Lee, Hun-Su | - |
dc.contributor.author | 이헌수 | - |
dc.date.accessioned | 2011-12-14T07:58:30Z | - |
dc.date.available | 2011-12-14T07:58:30Z | - |
dc.date.issued | 2006 | - |
dc.identifier.uri | http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=255222&flag=dissertation | - |
dc.identifier.uri | http://hdl.handle.net/10203/48698 | - |
dc.description | 학위논문(석사) - 한국과학기술원 : 물리학과, 2006.2, [ ii, 43 p. ] | - |
dc.description.abstract | The $SF_6$/$O_2$ CCP plasma is widely used in industry. To measure and control etching characteristic, relation between etching ions/radicals and plasma property are searched. QMS and Langmuir probe are used to measure $n_2, T_e,$ EEDF and positive ion ratio. The experiment is done under fixed pressure of 50 mTorr. Firstly the $SF_6$ mixing ratio in the total gas is changed. Secondly the current applied to the electrode is changed. The relation between $n_e, T_e$ and relative F positive ion density shows discrepancy between the two experiments. However EEDF graph reveals a common underlying relation in the two experiments. By observing electron densities of high energy tail, in-situ monitoring of etching profile is possible. | eng |
dc.language | eng | - |
dc.publisher | 한국과학기술원 | - |
dc.title | (A) study on characteristics of $SF_6$/$O_2$ capacitive discharge with QMS and Langmuir probe | - |
dc.title.alternative | 사중극자 질량 분석기와 랑뮈어 탐침을 이용한 $SF_6$/$O_2$ 축전 결합 플라즈마의 특성에 관한 연구 | - |
dc.type | Thesis(Master) | - |
dc.identifier.CNRN | 255222/325007 | - |
dc.description.department | 한국과학기술원 : 물리학과, | - |
dc.identifier.uid | 020043470 | - |
dc.contributor.localauthor | Lee, Hun-Su | - |
dc.contributor.localauthor | 이헌수 | - |
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