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NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
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Incorporation and optical activation of erbium in silicon using molecular beam epitaxy Serna, R; Shin, JungHoon; Lohmeier, M; Vlieg, E; Polman, A; Alkemade, PFA, JOURNAL OF APPLIED PHYSICS, v.79, no.5, pp.2658 - 2662, 1996-03 |
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