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Optimization of long-range order in solvent vapor annealed poly(styrene)-block-poly(lactide) thin films for nanolithography

Baruth, Andrew; Seo, Myungeun; Lin, Chun Hao; Walster, Kern; Shankar, Arjun; Hillmyer, Marc A.; Leighton, C, ACS APPLIED MATERIALS & INTERFACES, v.6, no.16, pp.13770 - 13781, 2014-08

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