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Block copolymer multiple patterning integrated with conventional ArF lithography

Park, Seung-Hak; Shin, Dong-Ok; Kim, Bong-Hoon; Yoon, Dong-Ki; Kim, Kyoung-Seon; Lee, Si-Yong; Oh, Seok-Hwan; et al, SOFT MATTER, v.6, no.1, pp.120 - 125, 2010

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