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Direct low-temperature chemical vapor deposition of fully crystalline micro- and polycrystalline silicon thin films on SiO2 using plasma immersion ion implantation Shin, JungHoon; Huh, H, JOURNAL OF VACUUM SCIENCE TECHNOLOGY A-VACUUM SURFACES AND FILMS, v.18, no.1, pp.51 - 57, 2000 |
Formation of large highly textured crystalline Si film on SiO2 Huh, H; Kim, HS; Youm, Do-Jun; Shin, JungHoon, ELECTROCHEMICAL AND SOLID STATE LETTERS, v.6, pp.G88 - G90, 2003-07 |
Orientation-controlled nucleation of crystal silicon grains in amorphous silicon on a rolled nickel tape substrate Huh, H; Shin, JungHoon, APPLIED PHYSICS LETTERS, v.79, no.24, pp.3956 - 3958, 2001-12 |
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