전자 현미경 관찰에 의한 3층 레지스트 리소그라피 연구 = Electron microscopic investigation on trilayer resist processing for fine line optical lithography

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dc.contributor.advisor박신종-
dc.contributor.advisor이상수-
dc.contributor.advisorPark, Sin-Chong-
dc.contributor.advisorLee, Sang-Soo-
dc.contributor.author남기수-
dc.contributor.authorNam, Kee-Soo-
dc.date.accessioned2011-12-14T07:49:25Z-
dc.date.available2011-12-14T07:49:25Z-
dc.date.issued1986-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=65015&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/48130-
dc.description학위논문(석사) - 한국과학기술원 : 물리학과, 1986.2, [ iv, 71 p. ]-
dc.languagekor-
dc.publisher한국과학기술원-
dc.title전자 현미경 관찰에 의한 3층 레지스트 리소그라피 연구 = Electron microscopic investigation on trilayer resist processing for fine line optical lithography-
dc.typeThesis(Master)-
dc.identifier.CNRN65015/325007-
dc.description.department한국과학기술원 : 물리학과, -
dc.identifier.uid000821913-
dc.contributor.localauthor남기수-
dc.contributor.localauthorNam, Kee-Soo-
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PH-Theses_Master(석사논문)
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