플라즈마 화학 증착법으로 제작한 미세 결정 규소 박막의 특성에 관한 연구 = Charaterization of microcrystalline silicon films drepared by plasma enhanced chemical vapor deposition

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dc.contributor.advisor신성철-
dc.contributor.advisor이주천-
dc.contributor.advisorShin, Sung-Chul-
dc.contributor.advisorLee, Choo-Chon-
dc.contributor.author최광열-
dc.contributor.authorChoi, Kwang-Yeol-
dc.date.accessioned2011-12-14T07:26:45Z-
dc.date.available2011-12-14T07:26:45Z-
dc.date.issued1996-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=105327&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/47525-
dc.description학위논문(박사) - 한국과학기술원 : 물리학과, 1996.2, [ xi, 103 p. ]-
dc.languagekor-
dc.publisher한국과학기술원-
dc.subjectTEM-
dc.subjectPECVD-
dc.subjectXRD-
dc.subjectsilicon tetrafluoride-
dc.subjectmicrocrystalline silicon-
dc.subject플라즈마 화학증착법-
dc.subject미세결정 규소-
dc.title플라즈마 화학 증착법으로 제작한 미세 결정 규소 박막의 특성에 관한 연구 = Charaterization of microcrystalline silicon films drepared by plasma enhanced chemical vapor deposition-
dc.typeThesis(Ph.D)-
dc.identifier.CNRN105327/325007-
dc.description.department한국과학기술원 : 물리학과, -
dc.identifier.uid000895497-
dc.contributor.localauthor최광열-
dc.contributor.localauthorChoi, Kwang-Yeol-
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