펄스 마그테트론 스퍼터링 소스의 플라즈마 특성과 증착율에 대한 연구 = Characteristics of plasma and deposition rate in pulsed-DC magnetron sputtering source

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dc.contributor.advisor장홍영-
dc.contributor.advisorChang, Hong-young-
dc.contributor.author인정환-
dc.contributor.authorIn, Jeong-hwan-
dc.date.accessioned2011-12-14T07:25:31Z-
dc.date.available2011-12-14T07:25:31Z-
dc.date.issued2009-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=309038&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/47444-
dc.description학위논문(박사) - 한국과학기술원 : 물리학과, 2009. 2, [ v, 115 p. ]-
dc.languagekor-
dc.publisher한국과학기술원-
dc.subjectmagnetron sputtering-
dc.subjectpulsed-DC-
dc.subjection bombardment energy-
dc.subjectdeposition rate-
dc.subjecttwo step pulse-
dc.subject마그네트론 스퍼터링-
dc.subject직류 펄스-
dc.subject이온 충돌 에너지-
dc.subject증착율-
dc.subject이단 펄스-
dc.title펄스 마그테트론 스퍼터링 소스의 플라즈마 특성과 증착율에 대한 연구 = Characteristics of plasma and deposition rate in pulsed-DC magnetron sputtering source-
dc.typeThesis(Ph.D)-
dc.identifier.CNRN309038/325007 -
dc.description.department한국과학기술원 : 물리학과, -
dc.identifier.uid020045225-
dc.contributor.localauthor인정환-
dc.contributor.localauthorIn, Jeong-hwan-
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PH-Theses_Ph.D.(박사논문)
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