Phase-matched generation of coherent euv light by propagating localized field in plasmonic waveguide = 플라즈몬 도파로 내부의 증폭된 전기장에 의한 위상정합된 결맞음 극자외선 생성

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The objective of this research is to design and analyze plasmonic structure which can generate a large amount of coherent EUV (extreme-ultraviolet) light by near-field amplification of the incident femtosecond laser. Previously, it was reported that plasmonic nanostructures can induce localized field enhancement at a certain region, thereby creating high harmonics at a wavelength shorter than 100 nm. This new method of HHG (high harmonic generation) has a strong potential to be compact EUV light source which do not require complex optical configuration. However, harmonic conversion efficiency is quite low compared to that of conventional HHG techniques. In this report, we presented a plasmonic waveguide structure which exploits SPP (surface plasmon polariton) enhancement. Proposed plasmonic waveguide structure is composed of tapered conical waveguide part and sub-wavelength cylindrical waveguide part. Because SPP can propagate inside a sub-wavelength-scale waveguide, possible volume range of HHG could be considerably enlarged. The material for plasmonic waveguide structure is silver due to its smallest loss in the visible range of the optical spectrum. To get the optimum geometric parameters, we analyzed electro-magnetic behavior of plasmonic waveguide structure by both solving dispersion equation analytically and investigating XFDTD simulation results. Because of waveguide dispersion, coherence lengths for high harmonics are too short to generate high harmonic efficiently by constructive interference. To solve this problem, we introduced quasi-phase-matching method of dielectric thin film deposition. With 80 nm-thick $SiO_2$ layer at the inner wall of cylindrical waveguide, we could achieve spatial modulation period similar to fundamental wavelength of 800 nm, thereby increasing coherence length remarkably. Increase in coherence length implies huge gain of EUV signal amplitude. Theoretically, we can improve harmonic conversion efficiency at least by a fact...
Advisors
Kim, Seung-Wooresearcher김승우researcher
Description
한국과학기술원 : 기계공학전공,
Publisher
한국과학기술원
Issue Date
2010
Identifier
418894/325007  / 020083543
Language
eng
Description

학위논문(석사) - 한국과학기술원 : 기계공학전공, 2010.2, [ viii, 89 p. ]

Keywords

Field Enhancement; Surface Plasmon; High Harmonic Generation; EUV; 극자외선; 근접장 증폭; 표면 플라즈몬; 고차 조화파 생성

URI
http://hdl.handle.net/10203/45759
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=418894&flag=dissertation
Appears in Collection
ME-Theses_Master(석사논문)
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