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A study on the double insulating layer for HgCdTe MIS structure Jung, JW; Lee, Hee Chul; Wang, JS, THIN SOLID FILMS, v.290, pp.18 - 22, 1996-12 |
Role of Interface Reaction on Resistive Switching of Metal/Amorphous TiO2/Al RRAM Devices Jeong, Hu Young; Kim, Sung Kyu; Lee, JeongYong; Choi, Sung-Yool, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.158, no.10, pp.979 - 982, 2011 |
Scaling of Al2O3 dielectric for graphene field-effect transistors Fallahazad, B.; Lee, K.; Lian, G.; Kim, S.; Corbet, C. M.; Ferrer, D. A.; Colombo, L.; et al, APPLIED PHYSICS LETTERS, v.100, no.9, 2012-02 |
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