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Etching behavior and damage recovery of SrBi2Ta2O9 thin films Lee, WJ; Cho, CR; Kim, SH; You, IK; Kim, BW; Yu, BG; Shin, CH; et al, JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, v.38, no.12A, pp.1428 - 1431, 1999-12 |
Influence of High-Pressure Annealing Conditions on Ferroelectric and Interfacial Properties of Zr-Rich HfxZr1-xO2 Capacitors Das, Dipjyoti; Buyantogtokh, Batzorig; Gaddam, Venkateswarlu; Jeon, Sanghun, IEEE TRANSACTIONS ON ELECTRON DEVICES, v.68, no.4, pp.1996 - 2002, 2021-04 |
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