Browse "EE-Journal Papers(저널논문)" by Subject Hf0.5Zr0.5O2 (HZO)DE/FE stack remanent polarizationleakage currentthermal stability
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| Ferroelectricity in Al2O3/Hf0.5Zr0.5O2 Bilayer Stack: Role of Dielectric Layer Thickness and Annealing Temperature Das, Dipjyoti; Gaddam, Venkateswarlu; Jeon, Sanghun, JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE, v.21, no.1, pp.62 - 67, 2021-02 |
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