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Improvement of Gate Dielectric Integrity Using O-2 Plasma Treatment Prior to Atomic Layer Deposition on Chemical Vapor Deposition Grown Graphene Sul, Onejae; Bong, Jaehoon; Yoon, Alex; Cho, Byung-Jin, JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.15, no.1, pp.220 - 223, 2015-01 |
Interface engineering for high performance graphene electronic devices Jung, Dae Yool; Yang, Sang Yoon; Park, Hamin; Shin, Woo-Cheol; Oh, Joong Gun; Cho, Byung-Jin; Choi, Sung-Yool, NANO CONVERGENCE, v.2, no.11, pp.1 - 17, 2015-06 |
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