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Impact of decoupled plasma nitridation of ultra-thin gate oxide on the performance of p-channel MOSFETs Lek, CM; Cho, Byung Jin; Ang, CH; Tan, SS; Loh, WY; Zhen, JZ; Lap, C, SEMICONDUCTOR SCIENCE AND TECHNOLOGY, v.17, no.6, pp.25 - 28, 2002-06 |
Negative bias temperature instability on plasma-nitrided silicon dioxide film Ang, CH; Lek, CM; Tan, SS; Cho, Byung Jin; Chen, TP; Lin, WH; Zhen, JZ, JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, v.41, no.3B, pp.314 - 316, 2002-03 |
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