Browse "EE-Journal Papers(저널논문)" by Author Woo, Seong-Ihl
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| Characterization and removal of trace heavy metal contamination on Si-surface resulted from CHF3/C2F6 reactive ion etching Lee, Chun Su; Kang, Seung Yul; Woo, Seong-Ihl; Baek, Jong Tae; Yoo, Hyung Joun, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.36, no.4A, pp.2096 - 2100, 1997-04 |
| Modeling and characterization of gas-phase etching of thermal oxide and TEOS oxide using anhydrous HF and CH3OH Lee, CS; Baek, JT; Yoo, Hyung Joun; Woo, Seong-Ihl, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.143, no.3, pp.1099 - 1103, 1996-03 |
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