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Channel Mobility Boosting in a Poly-Si Channel Using Ge Diffusion Engineering and Hydrogen Plasma Treatment Lee, Tae In; Kim, Min Ju; Shin, Eui Joong; Lee, Gyusoup; Jeong, Jaejoong; Lee, Yun Hee; Lee, Jung Hoon; et al, IEEE ELECTRON DEVICE LETTERS, v.43, no.3, pp.342 - 345, 2022-03 |
Grain Size Engineering using Amorphous-Ge/Si Stack to Enhance Channel Mobility for NAND Flash Memory Lee, Tae In; Kim, Min Ju; Shin, Eui Joong; Lee, Gyusoup; Jeong, Jaejoong; Lee, Yun Hee; Lee, Jung Hoon; et al, IEEE TRANSACTIONS ON ELECTRON DEVICES, v.69, no.10, pp.5940 - 5943, 2022-10 |
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