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Characterization and removal of trace heavy metal contamination on Si-surface resulted from CHF3/C2F6 reactive ion etching Lee, Chun Su; Kang, Seung Yul; Woo, Seong-Ihl; Baek, Jong Tae; Yoo, Hyung Joun, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.36, no.4A, pp.2096 - 2100, 1997-04 |
Dry release for surface micromachining with HF vapor-phase etching Lee, Yong-Il; Park, Kyung-Ho; Lee, Jong Hyun; Lee, Chun Su; Yoo, Hyung Joun; Kim, Chang-Jin; Yoon, Yong-San, JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, v.6, no.3, pp.226 - 233, 1997-09 |
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