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Growth behavior of copper metalorganic chemical vapor deposition using the (hfac)Cu(VTMOS) precursor on titanium nitride substrates Jun, CH; Kim, YT; Baek, JT; Yoo, Hyung Joun; Kim, DR, JOURNAL OF VACUUM SCIENCE TECHNOLOGY A-VACUUM SURFACES AND FILMS, v.14, no.6, pp.3214 - 3219, 1996 |
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