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Characterization and removal of trace heavy metal contamination on Si-surface resulted from CHF3/C2F6 reactive ion etching

Lee, Chun Su; Kang, Seung Yul; Woo, Seong-Ihl; Baek, Jong Tae; Yoo, Hyung Joun, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.36, no.4A, pp.2096 - 2100, 1997-04

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