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A NOVEL ELECTRON-BEAM EXPOSURE EPITAXY FOR GROWING GAAS FILMS ON FLUORIDE SI STRUCTURES Lee, Hee Chul; ISHIWARA, H; KANEMARU, S; FURUKAWA, S, JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, v.26, no.11, pp.1834 - 1836, 1987-11 |
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