Browse "EE-Journal Papers(저널논문)" by Author Gentili, M
Showing results 1 to 3 of 3
| A novel X-ray mask concept for mixmatch lithography fabrication of MOS devices by synchrotron radiation lithography. DiFabrizio, E; Grella, L; Gentili, M; Baciocchi, M; Mastrogiacomo, L; Choi, Sang-Soo; Jeon,Young Jin; et al, MICROELECTRONIC ENGINEERING, v.35, no.1-4, pp.553 - 556, 1997-02 |
| A novel X-ray mask for mix-and-match of optical and X-ray lithography applied in SOI device fabrication Choi, Sang-Soo; Kim, Jong Soo; Di Fabrizio, E; Gentili, M; Chung, Hai Bin; Yoo, Hyung Joun; Kim, Bo Woo, JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.32, no.5, pp.727 - 730, 1998-05 |
| Exposure latitude and CD control study for additively patterned x-ray mask with GBit DRAM complexity. Baciocchi, M; DiFabrizio, E; Gentili, M; Grella, L; Maggiora, L; Mastrogiacomo, L; Peschiaroli, D; et al, MICROELECTRONIC ENGINEERING, v.30, no.1-4, pp.195 - 198, 1996-01 |
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