Browse "EE-Journal Papers(저널논문)" by Author Chung, Hai Bin
Showing results 1 to 5 of 5
| A novel X-ray mask concept for mixmatch lithography fabrication of MOS devices by synchrotron radiation lithography. DiFabrizio, E; Grella, L; Gentili, M; Baciocchi, M; Mastrogiacomo, L; Choi, Sang-Soo; Jeon,Young Jin; et al, MICROELECTRONIC ENGINEERING, v.35, no.1-4, pp.553 - 556, 1997-02 |
| A novel X-ray mask for mix-and-match of optical and X-ray lithography applied in SOI device fabrication Choi, Sang-Soo; Kim, Jong Soo; Di Fabrizio, E; Gentili, M; Chung, Hai Bin; Yoo, Hyung Joun; Kim, Bo Woo, JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.32, no.5, pp.727 - 730, 1998-05 |
| Electron beam damage in the SiN membrane of an X-ray lithography mask Choi, Sang-Soo; Kim, Jong Soo; Chung, Hai Bin; Yoo, Hyung Joun; Kim, Bo-Woo, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.37, no.1, pp.360 - 363, 1998-01 |
| Small-field exposure system for 193-nm lithography Kim, Doh Hoon; Kim, Jong Soo; Lee, Kag Hyeon; Choi, Sang Soo; Chung, Hai Bin; Yoo, Hyung Joun; Kim, Bo Woo, JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.32, no.4, pp.486 - 490, 1998-04 |
| Two-wavelength anti-reflection coating for ArF excimer laser lithography optics Kim, Jong Soo; Chung, Hai Bin; Yoo, Hyung Joun; Kim, Bo Woo, JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.33, no.2, pp.136 - 142, 1998-08 |
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