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Effects of Si/SiO2 interface stress on the performance of ultra-thin-body field effect transistors: A first-principles study Jung, Hyo Eun; Shin, Mincheol, NANOTECHNOLOGY, v.29, no.2, 2018-01 |
Performance Assessment of III-V Channel Ultra-Thin-Body Schottky-Barrier MOSFETs Lee, Jaehyun; Shin, Mincheol, IEEE ELECTRON DEVICE LETTERS, v.35, no.7, pp.726 - 728, 2014-07 |
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