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FORMATION OF HIGH-QUALITY ULTRATHIN OXIDE NITRIDE (ON) STACKED CAPACITORS BY IN-SITU MULTIPLE RAPID THERMAL-PROCESSING HAN, LK; Yoon, Giwan; KIM, J; YAN, J; KWONG, DL, IEEE ELECTRON DEVICE LETTERS, v.16, no.8, pp.348 - 350, 1995-08 |
MOS CHARACTERISTICS OF ULTRATHIN NO-GROWN OXYNITRIDES BHAT, M; KIM, J; YAN, J; Yoon, Giwan; HAN, LK; KWONG, DL, IEEE ELECTRON DEVICE LETTERS, v.15, no.10, pp.421 - 423, 1994-10 |
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