Showing results 1 to 2 of 2
Evaluation of SOHOS (polysilicon-oxide-high-K-oxide-silicon) structure for Flash memory device application Cho, Byung Jin; Tan, YN; Chim, WK; Choi, WK; Joo, MS; Ng, TH, International Conference on Materials for Advanced Technologies, pp.19 - 20, 2005-07-03 |
High-K HfAlO Charge Trapping Layer in SONOS-type Nonvolatile Memory Device for High Speed Operation Cho, Byung Jin; Tan, YN; Chim, WK; Choi, WK; Sig, JM; Hau, NT, International Electron Device Meeting (IEDM), December 2004, pp.889 - 892, 2004-12-13 |
Discover