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Characterization of Ultrathin Plasma Nitrided Gate Dielectrics in PMOSFET for 0.18µm Technology and Beyond

Cho, Byung Jin; Tan, SS; Ang, CH; Lek, CM; Chen, T; See, A; Chan, L, 9th International Symp. on the Physical and Failure Analysis of Integrated Circuits (IPFA), pp.254 - 254, 2002-07-08

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