Browse "EE-Conference Papers(학술회의논문)" by Author Kalra, P
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| Demonstration of High Performance PMOSFETs Using Si/SixGe1-x/Si Quantum Wells with High-k/Metal Gate Stacks and Uniaxial Strain Additivity for 22 nm T Cho, Byung Jin; Suthram, S; Majhi, P; Sun, G; Kalra, P; Harris, R; Choi, KJ, International Electron Device Meeting (IEDM) 2007, pp.0 - 0, 2007-12-01 |
| High performance pMOSFETs using Si/SiGe/Si quantum wells with high-K/metal gate stacks and additive uniaxial strain for 22nm technology node Cho, Byung Jin; Suthram, S; Majhi, P; Sun, G; Kalra, P; Harris, HR; Choi, KJ, International Electron Devices Meeting, pp.727 - 730, 2007 |
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