DC Field | Value | Language |
---|---|---|
dc.contributor.author | Choi, Yang-Kyu | ko |
dc.contributor.author | Lee, JS | ko |
dc.contributor.author | Zhu, J | ko |
dc.contributor.author | Somorjai, GA | ko |
dc.contributor.author | Lee, LP | ko |
dc.contributor.author | Bokor, J | ko |
dc.date.accessioned | 2008-04-15T02:31:14Z | - |
dc.date.available | 2008-04-15T02:31:14Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2003-11 | - |
dc.identifier.citation | JOURNAL OF VACUUM SCIENCE TECHNOLOGY B, v.21, no.6, pp.2951 - 2955 | - |
dc.identifier.issn | 1071-1023 | - |
dc.identifier.uri | http://hdl.handle.net/10203/3856 | - |
dc.description.abstract | We describe parallel processes for nanometer pattern generation on a wafer scale with resolution comparable to the best electron beam lithography. Sub-10 nm linewidth is defined by a sacrificial ultrathin film deposited by low pressure chemical vapor deposition (LPCVD), in a process similar to formation of gate sidewall spacers in CMOS processing. We further demonstrate a method called iterative spacer lithography (ISL), in which the process is repeated multiple times with alternating materials in order to multiply the pattern density. Silicon structures with sub-10 nm width fabricated by this process were used as a mold in nanoimprint lithography and lift-off patterning of sub-30 nm platinum nanowires for use in experiments on chemical catalysis. We also demonstrate a similar process called reversed spacer lithography (RSL) to form sub-10 nm fluid channels in poly-Si. This nanogap fluid channel device was used for label-free detection of DNA hybridization based on electrical sensing of dielectric changes in the gap. (C) 2003 American Vacuum Society. | - |
dc.description.sponsorship | This research was sponsored by the SRC under Contract No. 2000-NJ-850 and MARCO Contract No. 2001-MT-887. This work was partially supported by the Korea Science and Engineering Foundation (KOSEF). | en |
dc.language | English | - |
dc.language.iso | en_US | en |
dc.publisher | A V S AMER INST PHYSICS | - |
dc.subject | HYBRIDIZATION | - |
dc.subject | SENSOR | - |
dc.subject | CMOS | - |
dc.title | Sublithographic nanofabrication technology for nanocatalysts and DNA chips | - |
dc.type | Article | - |
dc.identifier.wosid | 000188193600126 | - |
dc.identifier.scopusid | 2-s2.0-0942267534 | - |
dc.type.rims | ART | - |
dc.citation.volume | 21 | - |
dc.citation.issue | 6 | - |
dc.citation.beginningpage | 2951 | - |
dc.citation.endingpage | 2955 | - |
dc.citation.publicationname | JOURNAL OF VACUUM SCIENCE TECHNOLOGY B | - |
dc.identifier.doi | 10.1116/1.1627805 | - |
dc.embargo.liftdate | 9999-12-31 | - |
dc.embargo.terms | 9999-12-31 | - |
dc.contributor.localauthor | Choi, Yang-Kyu | - |
dc.contributor.nonIdAuthor | Lee, JS | - |
dc.contributor.nonIdAuthor | Zhu, J | - |
dc.contributor.nonIdAuthor | Somorjai, GA | - |
dc.contributor.nonIdAuthor | Lee, LP | - |
dc.contributor.nonIdAuthor | Bokor, J | - |
dc.type.journalArticle | Article; Proceedings Paper | - |
dc.subject.keywordPlus | HYBRIDIZATION | - |
dc.subject.keywordPlus | SENSOR | - |
dc.subject.keywordPlus | CMOS | - |
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