불순물 확산을 사용하는 CMOS 공정CMOS process using impurity diffusion

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Advisors
김충기Kim, Choong-Ki
Description
한국과학기술원 : 전기및전자공학전공,
Publisher
한국과학기술원
Issue Date
2000
Identifier
157412/325007 / 000983024
Language
kor
Description

학위논문(석사) - 한국과학기술원 : 전기및전자공학전공, 2000.2, [ 53 p. ]

Keywords

불순물 확산; 확산; CMOS; Boron penetration; Diffusion

URI
http://hdl.handle.net/10203/37253
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=157412&flag=dissertation
Appears in Collection
EE-Theses_Master(석사논문)
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