DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lee, Minyeul | ko |
dc.contributor.author | Yoon, Sungyoung | ko |
dc.contributor.author | Lim, Meehyun | ko |
dc.contributor.author | Kim, Sungyeol | ko |
dc.contributor.author | Shin, Jonghwa | ko |
dc.date.accessioned | 2024-08-30T03:00:09Z | - |
dc.date.available | 2024-08-30T03:00:09Z | - |
dc.date.created | 2024-08-29 | - |
dc.date.issued | 2024-06 | - |
dc.identifier.citation | PLASMA SOURCES SCIENCE & TECHNOLOGY, v.33, no.6 | - |
dc.identifier.issn | 0963-0252 | - |
dc.identifier.uri | http://hdl.handle.net/10203/322485 | - |
dc.description.abstract | Precise control of electromagnetic fields is critical in many advanced manufacturing processes, such as those used in the semiconductor industry, where device performance relies on precision and uniformity. Here, we introduce a solution to control electromagnetic fields via permittivity modulation without the limitations of resonance-based approaches, through a patterned semiconductor enabling permittivity tuning via carrier-density modulation. This carrier-responsive metamaterial (CRM) exhibits frequency-independent performance over a broad frequency spectrum and significant permittivity tunability through controlled semiconductor conductivity. Furthermore, the conductivity response and the tuning range can be easily modulated through the variation of semiconductor materials and geometrical parameters. We present an intuitive model that explains the relationship between the CRM's structure and properties, including its effective permittivity and loss tangent. Supported by comprehensive simulations and experimental validations, our findings show that the effective permittivity can be increased by over 3.5 times with low dielectric loss across a wide frequency range. As an application, we explore the CRM's potential in plasma control, revealing its ability to influence plasma density nearly 30% by modulating its effective permittivity, exhibiting CRM's versatile functionality and potential impact across diverse technological domains. | - |
dc.language | English | - |
dc.publisher | IOP Publishing Ltd | - |
dc.title | Tunable metamaterials with carrier-induced effective permittivity for active control of electromagnetic fields in semiconductor manufacturing device | - |
dc.type | Article | - |
dc.identifier.wosid | 001254829700001 | - |
dc.identifier.scopusid | 2-s2.0-85197347936 | - |
dc.type.rims | ART | - |
dc.citation.volume | 33 | - |
dc.citation.issue | 6 | - |
dc.citation.publicationname | PLASMA SOURCES SCIENCE & TECHNOLOGY | - |
dc.identifier.doi | 10.1088/1361-6595/ad57ee | - |
dc.contributor.localauthor | Shin, Jonghwa | - |
dc.contributor.nonIdAuthor | Yoon, Sungyoung | - |
dc.contributor.nonIdAuthor | Lim, Meehyun | - |
dc.contributor.nonIdAuthor | Kim, Sungyeol | - |
dc.description.isOpenAccess | N | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordAuthor | electromagnetic-field control | - |
dc.subject.keywordAuthor | metamaterial | - |
dc.subject.keywordAuthor | effective relative permittivity | - |
dc.subject.keywordAuthor | carrier excitation | - |
dc.subject.keywordAuthor | plasma controllability | - |
dc.subject.keywordPlus | STRIP WAVE-GUIDES | - |
dc.subject.keywordPlus | BASIC PARAMETERS | - |
dc.subject.keywordPlus | ELECTRIC-FIELD | - |
dc.subject.keywordPlus | FABRICATION | - |
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